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Product Category
Precursors
Halogenated Efficient SIHCL₃ in Wafer Production
Silicon-Based Volatile Si(CO2H5)4 for Surface Coating
C₃H₉Al (TMA)
Cl₆Si₂ (HCDS)
C₄H₁₂Si (4MS)
SIH₂CL₂ (DCS)
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Speciality Gases
Xe
Ne
Kr
He
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Electronic Gases
Acidic Electronic-Grade HCL for Microelectronics Etching
Chlorinated High-Purity SICL₄ for Silicon Deposition
High Purity Specialized ASH₃ for Semiconductor Doping
Corrosive Industrial CL₂ in Wafer Cleaning
Fluorinated Stable C₂F₆ for Plasma Etching
Highly Reactive High Purity B₂H₆ in Semiconductor Fabrication
Ultra-Pure Flammable GeH₄ for Thin-Film Deposition
High-Purity Corrosive NH₃ Gas for Semiconductor Processing
TiCl₄
C₃H₈
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