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Acidic Electronic-Grade HCL for Microelectronics Etching
Is a colorless non-flammable gas, has a very stimulating smell, the proportion is larger than air, in the case of humid air to produce white fog, easily soluble in water, hydrochloric acid. Strong corrosive, can react with a variety of metals to produce hydrogen, can form an explosive mixture with air, in case of cyanide to produce highly toxic hydrogen cyanide.
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Halogenated Efficient SIHCL₃ in Wafer Production
It is a colorless transparent liquid with the molecular formula CIBHSi and molecular weight 135.45. It is used as raw material of high polymer organosilicon compound and also used in instrument industry.
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Chlorinated High-Purity SICL₄ for Silicon Deposition
At room temperature is a colorless liquid, volatile, strong iritant, due to hydrolysis in humid air and white acid mist, commonly used as smoke agent.
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High Purity Specialized ASH₃ for Semiconductor Doping
Arsine gas is the simplest arsenic compound, colorless, highly toxic, flammable gas. Under standard conditions, AsH3 is a colorless, denser than air, soluble in water (200 mL/L) and a variety of organic solvents.
 
Application:Semiconductor
Purity:99.9999%/99.99995%
CAS:7784-42-1
Package:Cylinder
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Silicon-Based Volatile Si(CO2H5)4 for Surface Coating
Colorless liquid. Flammable. Slightly soluble in water, hydrolysis is slow in pure water, and can accelerate hydrolysis in the presence of acid or base; The reaction with boiling water gives silica sol without electrolyte. Ethyl orthosilicate reacts with higher alcohols or their esters in the presence of a catalyst.
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Corrosive Industrial CL₂ in Wafer Cleaning
Chlorine gas is yellow-green at normal temperature and pressure, and is a poisonous gas with a strong pungent smell. It is denser than air, soluble in water, easy to Compress, and can be liquefied into golden liquid chlorine. It is one of the main products of chlor-alkali industry and can be used as a strong oxidant.
 
Application:Semiconductor/Dry etching
Purity:99.999%
CAS:7782-50-5
Package:Cylinder
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Fluorinated Stable C₂F₆ for Plasma Etching
It is an organic compound, which is the product of six hydrogen atoms in ethane replaced by fluorine atoms. It is a colorless gas at normal
temperature and pressure. It is mainly used as an insulating gas, plasma etching agent, and high dielectric strength coolant.
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Highly Reactive High Purity B₂H₆ in Semiconductor Fabrication
 
It's the simplest borane you can isolate. Diborane gas is a colorless gas at room temperature. It forms an explosive mixture with air and spontaneously ignites in humid air. It is highly toxic.
 
Appliaction:Semiconductor/Doping
Purity:99.999%
CAS:19287-45-7
Package:Cylinder
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Ultra-Pure Flammable GeH₄ for Thin-Film Deposition
 
Geh4 is a colorless, highly toxic, flammable and noncorrosive gas. The thermal stability of germanane is poor, the autocatalysis of germanane is strong, once the decomposition formed metal covering film, it will be rapidly decomposed, so the decomposition explosion risk is very high.
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High-Purity Corrosive NH₃ Gas for Semiconductor Processing
Colorless gas. There is a strong pungent smell. Easily liquefied into a colorless liquid. Soluble in water, ethanol and ether. At high temperature, it will decompose into nitrogen and hydrogen, which has reducing effect.
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TiCl₄
It is an inorganic compound with the formula TiCl4. Titanium tetrachloride is an important intermediate in the production of titanium and its compounds. At room temperature, titanium tetrachloride is a colorless liquid and smokes in air to form a mixture of titanium dioxide solids and hydrochloric acid droplets.
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C₃H₈
It is usually a gaseous state, but is usually compressed into a liquid state and transported. After crude oil or natural gas treatment, propane can be obtained from the finished oil. Propane is commonly used as fuel for engines, barbecue food and home heating systems.
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CH₄
Methane is the simplest hydrocarbon. Widely exist in natural gas, biogas, coal mine pit gas, is a high quality gas fuel, is also an important raw material for manufacturing syngas and many chemical products.
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CHF₃
Trifluoromethane, also known as trifluoromethane, is a colorless, odorless, non-conductive gas that is an ideal substitute for halogens.
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CO
Is colorless, odorless, tasteless, toxic gas, insoluble in water, melting point -199 ° C, boiling point -191.5 ° C. Under the standard condition, the gas density is L.25g /L, which is very different from the air density (1.293g/L under the standard condition), which is also one of the factors prone to gas poisoning. It is a neutral gas.
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H₂S
It is an inorganic compound, soluble in water, soluble in alcohols, petroleum solvents and crude oil. Under standard conditions, it is a flammable acid gas, colorless, at low concentrations, it smells of rotten eggs, and at very low concentrations, it smells of sulfur and is highly toxic.
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NO
A man-made radioactive element, element symbol No, atomic number 102, valence +2, +3(stable valence), relative atomic mass (longest half-life isotope) 259, actinide
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CF₄
Insoluble in water. It's a halogenated hydrocarbon and it can be considered either a halogenated hydrocarbon, a halogenated methane, a perflu- orocarbon, or it can be considered an inorganic compound. Mainly used in various integrated circuit plasma etching process, also used as laser gas and refrigerant.
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C₂H₆
ethane The second member of the alkane family, the simplest hydrocarbon with carbon-carbon single bonds. Molecular formula C2H6. The content of ethane in some natural gas is 5%~10%, second only to methane; And exists in a dissolved state in petroleum.
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